Thermal Decomposition of Silicon Imide or Amide
In this process first SiCl4 is reacted with ammonia gas at a temperature range of -30.C to 70.C so as to produce silicon imide, tetramide monosilane and other related compounds. The formed materials converted to silicon nitride in special furnace at a temperature of 1600.C under nitrogen or ammonia atmosphere after separating ammonium chloride.
The reactions can be explained as follows:
SiCl4 + 6NH3 Si(NH)2 + 4NH4Cl
3Si (NH)2 (1600.C) Si3N4 + 2NH3
To be contd…
